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Halocarbon 23 - Trifluoromethane - ( CHF3 )
Trifluoromethane is a colorless , non-flammable and liquefied gas .It is shipped as a liquefied gas under its own vapor pressure.
| Specifications | ||
| Purity , % | 99.9 | 99.999 |
| Oxygen | ≤80 ppmv | ≤1.0 ppmv |
| Nitrogen | ≤300 ppmv | ≤4.0 ppmv |
| Carbon Dioxide | ≤50 ppmv | ≤0.5 ppmv |
| Carbon Monoxide | ≤30 ppmv | ≤0.5 ppmv |
| Methane | ≤30 ppmv | ≤0.5 ppmv |
| Other Organics | ≤400ppmv | ≤2.0 ppmv |
| Water | ≤10.0 ppmv | ≤2.0 ppmv |
| Acidity as HCL | ≤1.0 ppmv | ≤0.1 ppmv |
| Ship | ||
| DOT Shipping Name | Trifluoromethane | |
| DOT Classification | 2.2 | |
| DOT Label | Non-flammable | |
| UN Number | UN 1984 | |
| CAS No. | 75-46-7 | |
| CGA/DISS/JIS | 660/716/W22-14L | |
| Shipped as | Liquefied Gas | |
| Technical Information | ||
| Cylinder State @ 21.1°C | Liquid | |
| Flammable Limits In Air | Non-flammable | |
| Auto Ignition Temperature (°C ) | - | |
| Molecular Weight (g/mol) | 70 | |
| Specific gravity (air =1) | 2.436 | |
| Critical Temperature ( °C ) | 178.43 | |
| Critical Pressure ( psig ) | 686.719 | |
| Applications | ||
|
· Trifluoromethane (CHF3) is used in plasma etching of silicon oxide or nitride layers. · CHF3 is a low temperature refrigerant. It is replacing chlorodifuoromethane (R22 or CHF2Cl) | ||